Silicon dioxide, crystalline (fine), coating quality, >=99.9%

Code: 85356-100G D2-231

General description

SiO2 is majorly used as a substrate material with excellent thermo-mechanical properties in a variety of applications which include: vapour dep...


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€200.20 100G
€246.25 inc. VAT
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General description

SiO2 is majorly used as a substrate material with excellent thermo-mechanical properties in a variety of applications which include: vapour deposition, phase deposition, atomic force microscopy probes(AFM, spin coating, and electronic based devices.

assay≥99.9%
density2.6 g/mL at 25 °C (lit.)
formgranular
InChI keyVYPSYNLAJGMNEJ-UHFFFAOYSA-N
InChI1S/O2Si/c1-3-2
manufacturer/tradenameUmicore Materials AG
mp1610 °C (lit.)
particle size0.2-0.7 mm
Quality Level100
refractive indexn20/D 1.544 (lit.)
SMILES stringO=[Si]=O
Cas Number60676-86-0
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